- Produtos & Fornecimento
- Gases atmosféricos
- Químicos e Gases para Eletrônica
- Produtos Químicos
- Produtos Farmacêuticos
- Arc Equipment and Accessories
- Conceito HiQ
- Modais de abastecimento
Fluorine is an active element required for all dry chamber cleaning processes. Our Generation-F® on-site fluorine generators provide the lowest cost-per-clean for plasma-enhanced or thermal CVD tool dry-chamber cleaning. Fluorine is the ideal replacement for fluorine-bearing gases such as NF3, ClF3, SF6 and F2/N2 mixtures where inactive components can compromise cleaning performance.
Ultra-pure fluorine gas delivered from Generation-F systems offers the highest cleaning performance, productivity gains relative to CVD tools, and reduced energy consumption and environmental impact thanks to zero Global Warming Potential (GWP).
This series comes in a modular design capable of meeting all flow, concentration and volume requirements ranging from one tonne to hundreds of tonnes each year So whether you operate a single tool or a large-scale fab, we have the solution for you. Benefits and highlights of Generation-F on-site generators include:
Improved productivity thanks to safe, reliable supply of high-purity fluorine
Sustainable alternative to high-GWP gases nitrogen trifluoride (NF3) and sulphur hexafluoride (SF6) for CVD chamber cleaning
Elimination of large volume, high-pressure storage facilities
Large installed base.
Currently, more than 30 Generation-F systems are installed worldwide.
Downloads – On-site Fluorine generation
|Green Processes for low cost and high
|Climate-friendly thin-film PV||353 KB|
|Photovoltaics International – Carbon footprint of
PECVD chamber cleaning